Recent Patents on Measurement of Parallelism of Plates

Background: Parallel plate structures are widely used in micro-electromechanical systems, and the measuring technology of parallelism of parallel plates becomes more and more inevitable. More and more attention has been paid on the development of measuring technology of parallelism of parallel plates. Objective: To meet the increasing requirement of measuring precision and measuring efficiency of parallelism measurement of parallel plates, the measuring devices and measuring methods of the parallelism measurement are constantly being enhanced. Methods: This paper retraces varieties of representative patents relevant to the measuring devices and measuring methods of the parallelism measurement of parallel plates. Results: Through retracing the characteristics of different types of measuring devices and measuring methods of parallelism measurement of parallel plates, the main problems existing in the current development such as low measuring precision and low measuring efficiency are concluded and analyzed. Development of patents on the measuring devices and measuring methods of the parallelism measurement is discussed in the future. Conclusion: The optimization and development of parallelism measurement are beneficial to improve measuring precision and measuring efficiency of parallelism measurement of parallel plates. More related patents on parallelism measurement of parallel plates will be invented.