Skip to content
2000
Volume 5, Issue 1
  • ISSN: 1872-2105
  • E-ISSN: 2212-4020

Abstract

Currently there is great interest in patterned silicon nanowire arrays and applications. The accurately controlled fabrication of patterned silicon nanowire arrays with the desirable axial crystallographic orientation using simpler and quicker ways is very desirable and of great importance to material synthesis and future nanoscale optoelectronic devices that employ silicon. The recent advances in manipulating patterned silicon nanowire arrays and patents are reviewed with a focus on the progress of nanowire fabrication and applications.

Loading

Article metrics loading...

/content/journals/nanotec/10.2174/187221011794474921
2011-01-01
2025-09-28
Loading full text...

Full text loading...

/content/journals/nanotec/10.2174/187221011794474921
Loading
This is a required field
Please enter a valid email address
Approval was a Success
Invalid data
An Error Occurred
Approval was partially successful, following selected items could not be processed due to error
Please enter a valid_number test