Full text loading...
Monoclinic β-GeSe2 exhibits strong in-plane anisotropy, a wide direct bandgap, and strain-tunable properties, making it a promising material for ultraviolet photodetection and optoelectronic applications. This mini-review examines the strain engineering of β-GeX2 (X = S, Se), with a focus on its electronic and optical properties.
Density functional theory (DFT) calculations provide insights into the structural, electronic, and optical characteristics of bulk and monolayer β-GeX2. The impact of biaxial strain on the band structure, dielectric function, absorption, and refractive index is examined.
Tensile strain narrows the bandgap in monolayer β-GeX2, while compressive strain induces a direct-to-indirect transition. The static dielectric constant ε1(0) ranges from 2.16 (compressive) to 4.65 (tensile), with the absorption peak shifting from 6.25 eV (compressive) to 7.07 eV (tensile). The refractive index n(0) extends from 1.47 to 2.15, while the plasma frequency ωP shifts between 7.33 eV (compressive) and 8.91 eV (tensile). These findings are discussed with respect to current and future applications in optoelectronic devices.
Strain engineering in monolayer β-GeX2 offers a powerful tool to modulate its properties for next-generation optoelectronics. Further experimental research is needed to fully explore the capabilities of strain-engineered β-GeX2 materials for advanced devices.
Strain engineering enhances the tunability of β-GeX2 properties, demonstrating promising potential for optoelectronic applications. This study summarizes key findings and encourages further research, including the investigation of strain effects in other novel 2D materials to enhance device performance.