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2000
Volume 8, Issue 3
  • ISSN: 1573-4137
  • E-ISSN: 1875-6786

Abstract

Copper loaded nanostructure TiO2 thin films were deposited on glass substrates using the dip-coating method. The crystalline structure and surface morphology of Cu-loaded TiO2 thin film was characterized by X-ray diffraction analysis and Field emission scanning electron microscopy. X-ray photoelectron spectroscopy was used to evaluate the surface properties of the film surfaces. The transmittance spectra of the films were obtained by UV-vis spectrophotometer. Water contact angle on the film surfaces during irradiation and storage in a dark place was measured by a contact angle analyzer. The XPS results indicated that the hydroxyl content for TiO2 and copper loaded TiO2 thin films was calculated to be 14 % and 20 %, respectively. The transmittance results showed that copper loading enhanced the absorption of TiO2 at about 450 and 700-800 nm. The water contact angle results indicated that copper loading had a significant effect on the hydrophilicity of TiO2 thin film and maintaining it in a dark place for a long time.

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/content/journals/cnano/10.2174/157341312800620160
2012-06-01
2025-09-09
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/content/journals/cnano/10.2174/157341312800620160
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