Selection of Impurities
- By Kunihiro Suzuki1
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View Affiliations Hide Affiliations1 Fujitsu limited Minatoku kaigan 1 11-1 Tokyo, Japan.
- Source: Ion Implantation and Activation: Volume 1 , pp 3-7
- Publication Date: October 2013
- Language: English
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Various impurities are used in VLSI processes. The key factors for the selection of the impurities are their solid solubility and diffusion coefficient. B, As, P are commonly used as doping impurities due to their high solid solubility. In and Sb are sometimes used to realize shallow junctions due to their low diffusion coefficients. We briefly showwhere various impurities are used in two distinguished devices of bipolar transistors and MOS FET's.
Hardbound ISBN:
9781608057825
Ebook ISBN:
9781608057818
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